A procedure for the quantitative measurement of composition and strain in epitaxial Si1-xGex/Si heterostructures by means of Raman spectroscopy for any Ge concentration is presented. The calibration of the parameters of this procedure involved the growth of a set of heteroepitaxial layers spanning the range from pure Si to pure Ge. Different strain conditions were established in a highly controlled way by tailoring the substrate lattice parameter. Through the comparative analysis of reciprocal space mapping and Raman spectroscopy we obtained a set of parameters for the phonon energy variation due to biaxial deformation, as well as calibration curves for the dependence of the Raman band frequencies on alloy composition. With these new calibrations, Raman spectroscopy provides an accuracy in the determination of composition and strain comparable to that of X-ray diffraction, but with the added advantage of high-spatial resolution and resonance-induced surface confinement

Pezzoli, F., Bonera, E., Grilli, E., Guzzi, M., Sanguinetti, S., Chrastina, D., et al. (2008). Raman spectroscopy determination of composition and strain in Si1-xGex/Si heterostructures. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 11(5-6), 279-284 [10.1016/j.mssp.2008.09.012].

Raman spectroscopy determination of composition and strain in Si1-xGex/Si heterostructures

PEZZOLI, FABIO;BONERA, EMILIANO;GRILLI, EMANUELE ENRICO;GUZZI, MARIO;SANGUINETTI, STEFANO;
2008

Abstract

A procedure for the quantitative measurement of composition and strain in epitaxial Si1-xGex/Si heterostructures by means of Raman spectroscopy for any Ge concentration is presented. The calibration of the parameters of this procedure involved the growth of a set of heteroepitaxial layers spanning the range from pure Si to pure Ge. Different strain conditions were established in a highly controlled way by tailoring the substrate lattice parameter. Through the comparative analysis of reciprocal space mapping and Raman spectroscopy we obtained a set of parameters for the phonon energy variation due to biaxial deformation, as well as calibration curves for the dependence of the Raman band frequencies on alloy composition. With these new calibrations, Raman spectroscopy provides an accuracy in the determination of composition and strain comparable to that of X-ray diffraction, but with the added advantage of high-spatial resolution and resonance-induced surface confinement
Articolo in rivista - Articolo scientifico
Raman spectroscopy, SiGe, nanotechnology
English
2008
11
5-6
279
284
none
Pezzoli, F., Bonera, E., Grilli, E., Guzzi, M., Sanguinetti, S., Chrastina, D., et al. (2008). Raman spectroscopy determination of composition and strain in Si1-xGex/Si heterostructures. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 11(5-6), 279-284 [10.1016/j.mssp.2008.09.012].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/23480
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