Control of electron spin coherence via external fields is fundamental in spintronics. Its implementation demands a host material that accommodates the desirable but contrasting requirements of spin robustness against relaxation mechanisms and sizeable coupling between spin and orbital motion of the carriers. Here, we focus on Ge, which is a prominent candidate for shuttling spin quantum bits into the mainstream Si electronics. So far, however, the intrinsic spin-dependent phenomena of free electrons in conventional Ge/Si heterojunctions have proved to be elusive because of epitaxy constraints and an unfavourable band alignment. We overcome these fundamental limitations by investigating a two-dimensional electron gas in quantum wells of pure Ge grown on Si. These epitaxial systems demonstrate exceptionally long spin lifetimes. In particular, by fine-tuning quantum confinement we demonstrate that the electron Landé g factor can be engineered in our CMOS-compatible architecture over a range previously inaccessible for Si spintronics.

Giorgioni, A., Paleari, S., Cecchi, S., Vitiello, E., Grilli, E., Isella, G., et al. (2016). Strong confinement-induced engineering of the g factor and lifetime of conduction electron spins in Ge quantum wells. NATURE COMMUNICATIONS, 7 [10.1038/ncomms13886].

Strong confinement-induced engineering of the g factor and lifetime of conduction electron spins in Ge quantum wells

GIORGIONI, ANNA
Primo
;
PALEARI, STEFANO
Secondo
;
Cecchi, S;VITIELLO, ELISA;GRILLI, EMANUELE ENRICO;FANCIULLI, MARCO
Penultimo
;
PEZZOLI, FABIO
Ultimo
2016

Abstract

Control of electron spin coherence via external fields is fundamental in spintronics. Its implementation demands a host material that accommodates the desirable but contrasting requirements of spin robustness against relaxation mechanisms and sizeable coupling between spin and orbital motion of the carriers. Here, we focus on Ge, which is a prominent candidate for shuttling spin quantum bits into the mainstream Si electronics. So far, however, the intrinsic spin-dependent phenomena of free electrons in conventional Ge/Si heterojunctions have proved to be elusive because of epitaxy constraints and an unfavourable band alignment. We overcome these fundamental limitations by investigating a two-dimensional electron gas in quantum wells of pure Ge grown on Si. These epitaxial systems demonstrate exceptionally long spin lifetimes. In particular, by fine-tuning quantum confinement we demonstrate that the electron Landé g factor can be engineered in our CMOS-compatible architecture over a range previously inaccessible for Si spintronics.
Articolo in rivista - Articolo scientifico
Chemistry (all); Biochemistry, Genetics and Molecular Biology (all); Physics and Astronomy (all); resonance experiments; shallow donors; germanium; silicon; semiconductor; relaxation; spintronics; spectrum; stress
English
Giorgioni, A., Paleari, S., Cecchi, S., Vitiello, E., Grilli, E., Isella, G., et al. (2016). Strong confinement-induced engineering of the g factor and lifetime of conduction electron spins in Ge quantum wells. NATURE COMMUNICATIONS, 7 [10.1038/ncomms13886].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/149475
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