We present photoluminescence (PL) and spin polarized photo-emission (SPPE) measurements performed on bulk Ge, and Ge/Si(100) epilayers. A set of bi-axially strained Ge epilayers featuring different strain levels has been deposited by low energy plasma enhanced CVD (LEPECVD) and characterized by high resolution X-ray diffraction (HR-XRD). SPPE data indicate that compressive strain effectively lifts the heavy holes - light holes degeneracy raising the polarization of injected electrons above the P=50% limit of bulk material. Circularly polarized light PL measurements performed on p-type bulk crystals confirm the suitability of Ge for spintronics application showing a robust electron spin inizialization at the direct gap of Ge and giving a lower bound value for the spin relaxation time of ? 230 fs. © 2011 SPIE.

Isella, G., Bottegoni, F., Pezzoli, F., Cecchi, S., Gatti, E., Chrastina, D., et al. (2011). Optical spin injection in SiGe heterostructures. In H.M. Drouhin, J. Wegrowe, M. Razeghi (a cura di), Proceedings SPIE 8100, Spintronics IV, 810007 (September 15, 2011). S P I E - International Society for Optical Engineering [10.1117/12.892749].

Optical spin injection in SiGe heterostructures

PEZZOLI, FABIO;Cecchi, S;GATTI, ELEONORA;GRILLI, EMANUELE ENRICO;GUZZI, MARIO
Penultimo
;
2011

Abstract

We present photoluminescence (PL) and spin polarized photo-emission (SPPE) measurements performed on bulk Ge, and Ge/Si(100) epilayers. A set of bi-axially strained Ge epilayers featuring different strain levels has been deposited by low energy plasma enhanced CVD (LEPECVD) and characterized by high resolution X-ray diffraction (HR-XRD). SPPE data indicate that compressive strain effectively lifts the heavy holes - light holes degeneracy raising the polarization of injected electrons above the P=50% limit of bulk material. Circularly polarized light PL measurements performed on p-type bulk crystals confirm the suitability of Ge for spintronics application showing a robust electron spin inizialization at the direct gap of Ge and giving a lower bound value for the spin relaxation time of ? 230 fs. © 2011 SPIE.
Capitolo o saggio
Circularly polarized photoluminescence; Optical spin injection; SiGe epitaxy; Spin polarized photoemission; Applied Mathematics; Computer Science Applications1707 Computer Vision and Pattern Recognition; Electrical and Electronic Engineering; Electronic, Optical and Magnetic Materials; Condensed Matter Physics
English
Proceedings SPIE 8100, Spintronics IV, 810007 (September 15, 2011)
Drouhin, H-J M; Wegrowe, J-E; Razeghi, M
2011
9780819487100
8100
S P I E - International Society for Optical Engineering
810007
Isella, G., Bottegoni, F., Pezzoli, F., Cecchi, S., Gatti, E., Chrastina, D., et al. (2011). Optical spin injection in SiGe heterostructures. In H.M. Drouhin, J. Wegrowe, M. Razeghi (a cura di), Proceedings SPIE 8100, Spintronics IV, 810007 (September 15, 2011). S P I E - International Society for Optical Engineering [10.1117/12.892749].
none
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/78798
Citazioni
  • Scopus 3
  • ???jsp.display-item.citation.isi??? 3
Social impact