This study is aimed at investigating the performance of an advanced GaN HEMT technology for millimeter-wave applications. Both DC and frequency-dependent measurements are performed on three multifinger on-wafer 0.15-µm transistors with different gate widths at different ambient temperatures for foreseeing GaN technology capability when applications require challenging frequency operation.

Vadalà, V., Crupi, G., Giofre, R., Bosi, G., Raffo, A., Vannini, G. (2022). mm-Wave GaN HEMT Technology: Advances, Experiments, and Analysis. In Mediterranean Microwave Symposium (pp.1-6). IEEE Computer Society [10.1109/MMS55062.2022.9825553].

mm-Wave GaN HEMT Technology: Advances, Experiments, and Analysis

Vadalà Valeria
;
Bosi G.;
2022

Abstract

This study is aimed at investigating the performance of an advanced GaN HEMT technology for millimeter-wave applications. Both DC and frequency-dependent measurements are performed on three multifinger on-wafer 0.15-µm transistors with different gate widths at different ambient temperatures for foreseeing GaN technology capability when applications require challenging frequency operation.
paper
gallium nitride (GaN); high-electron-mobility transistor (HEMT); millimeter-wave frequency; multifinger layout; scattering parameter measurements; temperature;
English
21st Mediterranean Microwave Symposium, MMS 2021 - 9 May 2022 through 13 May 2022
2022
Mediterranean Microwave Symposium
9781665471107
2022
2022-May
1
6
9825553
https://ieeexplore.ieee.org/document/9825553
none
Vadalà, V., Crupi, G., Giofre, R., Bosi, G., Raffo, A., Vannini, G. (2022). mm-Wave GaN HEMT Technology: Advances, Experiments, and Analysis. In Mediterranean Microwave Symposium (pp.1-6). IEEE Computer Society [10.1109/MMS55062.2022.9825553].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/397080
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