Spectroscopic ellipsometry measurements on different plasma-enhanced chemical vapour deposited oxynitrides are reported in the 0.23-0.90 mum range. Results of direct calculation and of best-fit procedures based on the Sellmeier model and on the Bruggeman effective medium approximation used to obtain optical functions of the samples are compared

Borghesi, A., Sassella, A., & Rojas, S. (1993). Ellipsometric characterization of hydrogen-rich oxynitride films. THIN SOLID FILMS, 233(1-2), 227-230 [10.1016/0040-6090(93)90096-8].

Ellipsometric characterization of hydrogen-rich oxynitride films

Borghesi, A;Sassella, A;
1993

Abstract

Spectroscopic ellipsometry measurements on different plasma-enhanced chemical vapour deposited oxynitrides are reported in the 0.23-0.90 mum range. Results of direct calculation and of best-fit procedures based on the Sellmeier model and on the Bruggeman effective medium approximation used to obtain optical functions of the samples are compared
Articolo in rivista - Articolo scientifico
Scientifica
oxynitride thin films; ellipsometry
English
Borghesi, A., Sassella, A., & Rojas, S. (1993). Ellipsometric characterization of hydrogen-rich oxynitride films. THIN SOLID FILMS, 233(1-2), 227-230 [10.1016/0040-6090(93)90096-8].
Borghesi, A; Sassella, A; Rojas, S
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/10281/34543
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