Spectroscopic ellipsometry measurements on different plasma-enhanced chemical vapour deposited oxynitrides are reported in the 0.23-0.90 mum range. Results of direct calculation and of best-fit procedures based on the Sellmeier model and on the Bruggeman effective medium approximation used to obtain optical functions of the samples are compared
Borghesi, A., Sassella, A., Rojas, S. (1993). Ellipsometric characterization of hydrogen-rich oxynitride films. THIN SOLID FILMS, 233(1-2), 227-230 [10.1016/0040-6090(93)90096-8].
Ellipsometric characterization of hydrogen-rich oxynitride films
Borghesi, A;Sassella, A;
1993
Abstract
Spectroscopic ellipsometry measurements on different plasma-enhanced chemical vapour deposited oxynitrides are reported in the 0.23-0.90 mum range. Results of direct calculation and of best-fit procedures based on the Sellmeier model and on the Bruggeman effective medium approximation used to obtain optical functions of the samples are compared
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