Spectroscopic ellipsometry measurements on different plasma-enhanced chemical vapour deposited oxynitrides are reported in the 0.23-0.90 mum range. Results of direct calculation and of best-fit procedures based on the Sellmeier model and on the Bruggeman effective medium approximation used to obtain optical functions of the samples are compared

Borghesi, A., Sassella, A., Rojas, S. (1993). Ellipsometric characterization of hydrogen-rich oxynitride films. THIN SOLID FILMS, 233(1-2), 227-230 [10.1016/0040-6090(93)90096-8].

Ellipsometric characterization of hydrogen-rich oxynitride films

Borghesi, A;Sassella, A;
1993

Abstract

Spectroscopic ellipsometry measurements on different plasma-enhanced chemical vapour deposited oxynitrides are reported in the 0.23-0.90 mum range. Results of direct calculation and of best-fit procedures based on the Sellmeier model and on the Bruggeman effective medium approximation used to obtain optical functions of the samples are compared
Articolo in rivista - Articolo scientifico
oxynitride thin films; ellipsometry
English
1993
233
1-2
227
230
none
Borghesi, A., Sassella, A., Rojas, S. (1993). Ellipsometric characterization of hydrogen-rich oxynitride films. THIN SOLID FILMS, 233(1-2), 227-230 [10.1016/0040-6090(93)90096-8].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/34543
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