A critical analysis of the use of infrared spectroscopy to obtain a quantitative evaluation of precipitated oxygen in silicon is presented. Precipitates were detected and studied either indirectly or directly. It is shown that, in both cases, there are some limitations in the reliability of the results, so that a quantitative evaluation of the amount of precipitated oxygen is rarely achievable.

Sassella, A., Borghesi, A., Abe, T. (1998). Quantitative evaluation of precipitated oxygen in silicon by infrared spectroscopy: Still an open problem. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 145(5), 1715-1719 [10.1149/1.1838545].

Quantitative evaluation of precipitated oxygen in silicon by infrared spectroscopy: Still an open problem

SASSELLA, ADELE;BORGHESI, ALESSANDRO;
1998

Abstract

A critical analysis of the use of infrared spectroscopy to obtain a quantitative evaluation of precipitated oxygen in silicon is presented. Precipitates were detected and studied either indirectly or directly. It is shown that, in both cases, there are some limitations in the reliability of the results, so that a quantitative evaluation of the amount of precipitated oxygen is rarely achievable.
Articolo in rivista - Articolo scientifico
silicon; oxygen precipitation; infrared
English
1998
145
5
1715
1719
none
Sassella, A., Borghesi, A., Abe, T. (1998). Quantitative evaluation of precipitated oxygen in silicon by infrared spectroscopy: Still an open problem. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 145(5), 1715-1719 [10.1149/1.1838545].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/34397
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