A study of amorphous and polycrystalline silicon films deposited at different temperatures is presented. The effect of surface roughness on the quality of the fits to the spectroscopic ellipsometry data is assessed through a comparison with complementary atomic force microscopy images. © 1998 Elsevier Science S.A.

Borghesi, A., Tallarida, G., Amore, G., Cazzaniga, F., Queirolo, G., Alessandri, M., et al. (1998). Influence of roughness and grain dimension on the optical functions of polycrystalline silicon films. THIN SOLID FILMS, 313-314, 243-247 [10.1016/S0040-6090(97)00826-2].

Influence of roughness and grain dimension on the optical functions of polycrystalline silicon films

BORGHESI, ALESSANDRO;SASSELLA, ADELE
1998

Abstract

A study of amorphous and polycrystalline silicon films deposited at different temperatures is presented. The effect of surface roughness on the quality of the fits to the spectroscopic ellipsometry data is assessed through a comparison with complementary atomic force microscopy images. © 1998 Elsevier Science S.A.
Articolo in rivista - Articolo scientifico
polycrystalline silicon; thin films; roughness; ellipsometry
English
1998
313-314
243
247
none
Borghesi, A., Tallarida, G., Amore, G., Cazzaniga, F., Queirolo, G., Alessandri, M., et al. (1998). Influence of roughness and grain dimension on the optical functions of polycrystalline silicon films. THIN SOLID FILMS, 313-314, 243-247 [10.1016/S0040-6090(97)00826-2].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/34396
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