Organic molecular beam deposition (OMBD) in ultra-high vacuum is a valuable technique to carefully control the solid-state structure and properties of molecular thin films. Quaterthiophene (4T) and alpha,omega -dihexyl-quaterthiophene (DH4T) thin alms deposited by OMBD on potassium acid phthalate are investigated by atomic force microscopy (AFM). Direct evidence of epitaxial growth of the thin films is obtained by molecular resolution AFM images. The comparison between 4T and DH4T films reveals the role of chemical substituent groups in modifying the film properties

Borghesi, A., Besana, D., Sassella, A. (2001). Epitaxial growth of quaterthiophene thin films by organic molecular beam deposition. VACUUM, 61(2-4), 193-197 [10.1016/S0042-207X(00)00477-2].

Epitaxial growth of quaterthiophene thin films by organic molecular beam deposition

Borghesi, A;Sassella, A.
2001

Abstract

Organic molecular beam deposition (OMBD) in ultra-high vacuum is a valuable technique to carefully control the solid-state structure and properties of molecular thin films. Quaterthiophene (4T) and alpha,omega -dihexyl-quaterthiophene (DH4T) thin alms deposited by OMBD on potassium acid phthalate are investigated by atomic force microscopy (AFM). Direct evidence of epitaxial growth of the thin films is obtained by molecular resolution AFM images. The comparison between 4T and DH4T films reveals the role of chemical substituent groups in modifying the film properties
Articolo in rivista - Articolo scientifico
organic molecular beam deposition; molecular semiconductors; thin films; epitaxy; film structure
English
2001
61
2-4
193
197
none
Borghesi, A., Besana, D., Sassella, A. (2001). Epitaxial growth of quaterthiophene thin films by organic molecular beam deposition. VACUUM, 61(2-4), 193-197 [10.1016/S0042-207X(00)00477-2].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/2918
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