We have carried out deep level transient spectroscopy (DLTS), optical DLTS, and capacitance-voltage measurements on liquid phase epitaxy-grown Er-doped Si to characterize the deep levels present in the material and to identify those related to dislocations and involved in the luminescence activity. The optical properties of the material have been studied by photoluminescence, cathodoluminescence investigations, and two emission lines, labeled A and B, have been found, line A being located at 0.806 eV. We have observed that an actual interaction occurs between dislocations and Er-related emitting centers. © 1999 American Institute of Physics.

Cavallini, A., Fraboni, B., Pizzini, S., Binetti, S., Sanguinetti, S., Lazzarini, L., et al. (1999). Electrical and optical characterization of Er-doped silicon grown by liquid phase epitaxy. JOURNAL OF APPLIED PHYSICS, 85(3), 1582-1586 [10.1063/1.369289].

Electrical and optical characterization of Er-doped silicon grown by liquid phase epitaxy

Pizzini, S;SANGUINETTI, STEFANO;ACCIARRI, MAURIZIO FILIPPO;BINETTI, SIMONA OLGA
1999

Abstract

We have carried out deep level transient spectroscopy (DLTS), optical DLTS, and capacitance-voltage measurements on liquid phase epitaxy-grown Er-doped Si to characterize the deep levels present in the material and to identify those related to dislocations and involved in the luminescence activity. The optical properties of the material have been studied by photoluminescence, cathodoluminescence investigations, and two emission lines, labeled A and B, have been found, line A being located at 0.806 eV. We have observed that an actual interaction occurs between dislocations and Er-related emitting centers. © 1999 American Institute of Physics.
Articolo in rivista - Articolo scientifico
Erbium ; silicon, DLTS
English
1999
85
3
1582
1586
none
Cavallini, A., Fraboni, B., Pizzini, S., Binetti, S., Sanguinetti, S., Lazzarini, L., et al. (1999). Electrical and optical characterization of Er-doped silicon grown by liquid phase epitaxy. JOURNAL OF APPLIED PHYSICS, 85(3), 1582-1586 [10.1063/1.369289].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/23805
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