Ge vertical heterostructures grown on deeply-patterned Si(001) were first obtained in 2012 (C.V. Falub et al., Science 2012, 335, 1330–1334), immediately capturing attention due to the appealing possibility of growing micron-sized Ge crystals largely free of thermal stress and hosting dislocations only in a small fraction of their volume. Since then, considerable progress has been made in terms of extending the technique to several other systems, and of developing further strategies to lower the dislocation density. In this review, we shall mainly focus on the latter aspect, discussing in detail 100% dislocation-free, micron-sized vertical heterostructures obtained by exploiting compositional grading in the epitaxial crystals. Furthermore, we shall also analyze the role played by the shape of the pre-patterned substrate in directly influencing the dislocation distribution.

Montalenti, F., Rovaris, F., Bergamaschini, R., Miglio, L., Salvalaglio, M., Isella, G., et al. (2018). Dislocation-free SiGe/Si heterostructures. CRYSTALS, 8(6) [10.3390/cryst8060257].

Dislocation-free SiGe/Si heterostructures

Montalenti, F
;
Rovaris, F;Bergamaschini, R;Miglio, L;Salvalaglio, M;
2018

Abstract

Ge vertical heterostructures grown on deeply-patterned Si(001) were first obtained in 2012 (C.V. Falub et al., Science 2012, 335, 1330–1334), immediately capturing attention due to the appealing possibility of growing micron-sized Ge crystals largely free of thermal stress and hosting dislocations only in a small fraction of their volume. Since then, considerable progress has been made in terms of extending the technique to several other systems, and of developing further strategies to lower the dislocation density. In this review, we shall mainly focus on the latter aspect, discussing in detail 100% dislocation-free, micron-sized vertical heterostructures obtained by exploiting compositional grading in the epitaxial crystals. Furthermore, we shall also analyze the role played by the shape of the pre-patterned substrate in directly influencing the dislocation distribution.
Articolo in rivista - Review Essay
Defects; Elasticity; Heteroepitaxy; Plasma-enhanced chemical vapour deposition; Semiconductors;
Dislocations, heteroepitaxy
English
2018
8
6
257
open
Montalenti, F., Rovaris, F., Bergamaschini, R., Miglio, L., Salvalaglio, M., Isella, G., et al. (2018). Dislocation-free SiGe/Si heterostructures. CRYSTALS, 8(6) [10.3390/cryst8060257].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/201125
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