We analyze the growth of 1-nm-thick films of an organic molecule grown on silica by means of molecular beam deposition. Samples were deposited at a constant rate over a very wide substrate temperature range. By an ex situ atomic force microscopy study two main behaviors are revealed: for samples deposited below 200 K the density of islands is temperature independent and is demonstrated to arise from postnucleation phenomena; above 200 K island density scales with temperature following an Arrhenius law, allowing us to estimate an energy barrier for monomer diffusion of (0.122+/-0.011) eV.
Berlanda, G., Campione, M., Moret, M., Sassella, A., Borghesi, A. (2004). Evidence of postdeposition nucleation in organic molecular thin films. PHYSICAL REVIEW. B, CONDENSED MATTER AND MATERIALS PHYSICS, 69(8), 85409-1-85409-4 [10.1103/PhysRevB.69.085409].
Evidence of postdeposition nucleation in organic molecular thin films
CAMPIONE, MARCELLO;MORET, MASSIMO;SASSELLA, ADELE;BORGHESI, ALESSANDRO
2004
Abstract
We analyze the growth of 1-nm-thick films of an organic molecule grown on silica by means of molecular beam deposition. Samples were deposited at a constant rate over a very wide substrate temperature range. By an ex situ atomic force microscopy study two main behaviors are revealed: for samples deposited below 200 K the density of islands is temperature independent and is demonstrated to arise from postnucleation phenomena; above 200 K island density scales with temperature following an Arrhenius law, allowing us to estimate an energy barrier for monomer diffusion of (0.122+/-0.011) eV.
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