The problem of in situ monitoring the film thickness by quartz microbalance during vacuum deposition of organic-molecular semiconductors is addressed herein by setting a procedure for sensor calibration based on ex situ analysis of the deposited molecular film by atomic-force microscopy measurements. The procedure is applied to the growth of molecular-organic thin films on silica. Some physical parameters of the materials are deduced. (C) 2004 American Vacuum Society.
Campione, M., Cartotti, M., Pinotti, E., Sassella, A., & Borghesi, A. (2004). Thickness measurements by quartz microbalance during thin-film growth by organic-molecular-beam deposition. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. A, AN INTERNATIONAL JOURNAL DEVOTED TO VACUUM, SURFACES, AND FILMS, 22(3), 482-486 [10.1116/1.1690249].
Citazione: | Campione, M., Cartotti, M., Pinotti, E., Sassella, A., & Borghesi, A. (2004). Thickness measurements by quartz microbalance during thin-film growth by organic-molecular-beam deposition. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. A, AN INTERNATIONAL JOURNAL DEVOTED TO VACUUM, SURFACES, AND FILMS, 22(3), 482-486 [10.1116/1.1690249]. | |
Tipo: | Articolo in rivista - Articolo scientifico | |
Carattere della pubblicazione: | Scientifica | |
Titolo: | Thickness measurements by quartz microbalance during thin-film growth by organic-molecular-beam deposition | |
Autori: | Campione, M; Cartotti, M; Pinotti, E; Sassella, A; Borghesi, A | |
Autori: | ||
Data di pubblicazione: | mag-2004 | |
Lingua: | English | |
Rivista: | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. A, AN INTERNATIONAL JOURNAL DEVOTED TO VACUUM, SURFACES, AND FILMS | |
Digital Object Identifier (DOI): | http://dx.doi.org/10.1116/1.1690249 | |
Appare nelle tipologie: | 01 - Articolo su rivista |