Resistive-switching memory (RRAM) is receiving a growing deal of research interest as a possible solution for high-density, 3D nonvolatile memory technology. One of the main obstacle toward size reduction of the memory cell and its scaling is the typically large current Ireset needed for the reset operation. In fact, a large Ireset negatively impacts the scaling possibilities of the select diode in a cross-bar array structure. Reducing Ireset is therefore mandatory for the development of high-density RRAM arrays. This work addresses the reduction of Ireset in NiO-based RRAM by control of the filament size in 1 transistor-1 resistor (1T1R) cell devices. Ireset is demonstrated to be scalable and controllable below 10 μA. The significance of these results for the future scaling of diode-selected cross-bar arrays is finally discussed. © 2010 Elsevier B.V.

Nardi, F., Ielmini, D., Cagli, C., Spiga, S., Fanciulli, M., Goux, L., et al. (2011). Control of filament size and reduction of reset current below 10 μa in NiO resistance switching memories. SOLID-STATE ELECTRONICS, 58(1), 42-47 [10.1016/j.sse.2010.11.031].

Control of filament size and reduction of reset current below 10 μa in NiO resistance switching memories

FANCIULLI, MARCO;
2011

Abstract

Resistive-switching memory (RRAM) is receiving a growing deal of research interest as a possible solution for high-density, 3D nonvolatile memory technology. One of the main obstacle toward size reduction of the memory cell and its scaling is the typically large current Ireset needed for the reset operation. In fact, a large Ireset negatively impacts the scaling possibilities of the select diode in a cross-bar array structure. Reducing Ireset is therefore mandatory for the development of high-density RRAM arrays. This work addresses the reduction of Ireset in NiO-based RRAM by control of the filament size in 1 transistor-1 resistor (1T1R) cell devices. Ireset is demonstrated to be scalable and controllable below 10 μA. The significance of these results for the future scaling of diode-selected cross-bar arrays is finally discussed. © 2010 Elsevier B.V.
Articolo in rivista - Articolo scientifico
Crossbar architecture; Nonvolatile memory; Resistive-switching memory (RRAM); Transition metal oxide; Electrical and Electronic Engineering; Condensed Matter Physics; Electronic, Optical and Magnetic Materials; Materials Chemistry2506 Metals and Alloys
English
2011
58
1
42
47
none
Nardi, F., Ielmini, D., Cagli, C., Spiga, S., Fanciulli, M., Goux, L., et al. (2011). Control of filament size and reduction of reset current below 10 μa in NiO resistance switching memories. SOLID-STATE ELECTRONICS, 58(1), 42-47 [10.1016/j.sse.2010.11.031].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/78308
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