We compare four different selective etching solutions commonly used to highlight threading dislocations (TD), in SiGe hetero-epitaxial layers. The aim is to identify, amongst the many reported in the literature, an etching solution effective over the whole Ge concentration range. Etching experiments have been performed on Si1-xGex linearly graded relaxed buffer layers with a final germanium concentration x varying from x = 0.2 to 0.9. All samples have been deposited on Si(1 0 0) by low-energy plasma-enhanced chemical vapour deposition (LEPECVD). The experimental results show that a variant of the so-called Schimmel-etch is successful in revealing TD over the Ge concentration range investigated. (C) 2006 Elsevier Ltd. All rights reserved.

Marchionna, S., Virtuani, A., Acciarri, M., Isella, G., von Kaenel, H. (2006). Defect imaging of SiGe strain relaxed buffers grown by LEPECVD. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 9(4-5), 802-805 [10.1016/j.mssp.2006.09.003].

Defect imaging of SiGe strain relaxed buffers grown by LEPECVD

ACCIARRI, MAURIZIO FILIPPO;
2006

Abstract

We compare four different selective etching solutions commonly used to highlight threading dislocations (TD), in SiGe hetero-epitaxial layers. The aim is to identify, amongst the many reported in the literature, an etching solution effective over the whole Ge concentration range. Etching experiments have been performed on Si1-xGex linearly graded relaxed buffer layers with a final germanium concentration x varying from x = 0.2 to 0.9. All samples have been deposited on Si(1 0 0) by low-energy plasma-enhanced chemical vapour deposition (LEPECVD). The experimental results show that a variant of the so-called Schimmel-etch is successful in revealing TD over the Ge concentration range investigated. (C) 2006 Elsevier Ltd. All rights reserved.
Articolo in rivista - Articolo scientifico
Sige; virtual layers; defects etching; threading dislocations
English
ago-2006
9
4-5
802
805
none
Marchionna, S., Virtuani, A., Acciarri, M., Isella, G., von Kaenel, H. (2006). Defect imaging of SiGe strain relaxed buffers grown by LEPECVD. MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 9(4-5), 802-805 [10.1016/j.mssp.2006.09.003].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/726
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