Electrochemical characterization of the electrolyte/metal interface in microelectrodes for neuron stimulation and recording

Different materials have been integrated on planar and vertical structures as microelectrodes for neuron stimulation and recording. I will review the key functional properties of the electrolyte/electrode interface for neuroelectronic applications. I will focus on recent developments based on TiN and IrOx films grown by plasma assisted atomic layer deposition (PA-ALD). Physical-chemical properties of the layers, as determined by ToF-SIMS, XPS, Raman, and four-probe resistivity measurements, will be compared with the electrochemical characterization of the electrolyte (PBS)/electrode interface addressed with Impedance spectroscopy, Cyclic voltammetry, voltage transient, and electrochemical noise. The work is supported by the European FET-open project Neureka (www.neureka.gr).