Atomic layer deposited TiO2 for implantable brain-chip interfacing devices

In this paper we investigated atomic layer deposition (ALD) TiO2 thin films deposited on implantable neurochips based on electrolyte-oxide-semiconductor (EOS) junctions, implementing both efficient capacitive neuron-silicon coupling and biocompatibility for long-term implantable functionality. The ALD process was performed at 295 degrees C using titanium tetraisopropoxide and ozone as precursors on needle-shaped silicon substrates. Engineering of the capacitance of the EOS junctions introducing a thin Al2O3 buffer layer between TiO2 and silicon resulted in a further increase of the specific capacitance. Biocompatibility for long-term implantable neuroprosthetic systems was checked upon in-vitro treatment. (C) 2011 Elsevier B.V. All rights reserved.