SiGe islands have been proposed for applications in the fields of microelectronics, optoelectronics and thermoelectrics. Although most of the works in literature are based on MBE, one of the possible advantages of low-energy plasma-enhanced chemical vapor deposition (LEPECVD) is a wider range of deposition rates, which in turn results in the possibility of growing islands with a high Ge concentration. We will show that LEPECVD can be effectively used for the controlled growth of ordered arrays of SiGe islands. In order to control the nucleation of the islands, patterned Si (001) substrates were obtained by e-beam lithography (EBL) and dry etching. We realized periodic circular pits with diameters ranging from 80 to 300 nm and depths from 65 to 75 nm. Subsequently, thin films (0.8-3.2 nm) of pure Ge were deposited by LEPECVD, resulting in regular and uniform arrays of Ge-rich islands. LEPECVD allowed the use of a wide range of growth rates (0.01-0.1 nm s-1) and substrates temperatures (600-750°C), so that the Ge content of the islands could be varied. Island morphology was characterized by AFM, while μ-Raman was used to analyze the Ge content inside the islands and the composition differences between islands on patterned and unpatterned areas of the substrate. © 2010 The Author(s).

Bollani, M., Bonera, E., Chrastina, D., Fedorov, A., Montuori, V., Picco, A., et al. (2010). Ordered Arrays of SiGe Islands from Low-Energy PECVD. NANOSCALE RESEARCH LETTERS, 5(12), 1917-1920 [10.1007/s11671-010-9773-0].

Ordered Arrays of SiGe Islands from Low-Energy PECVD

BONERA, EMILIANO;PICCO, ANDREA;Vanacore, G;
2010

Abstract

SiGe islands have been proposed for applications in the fields of microelectronics, optoelectronics and thermoelectrics. Although most of the works in literature are based on MBE, one of the possible advantages of low-energy plasma-enhanced chemical vapor deposition (LEPECVD) is a wider range of deposition rates, which in turn results in the possibility of growing islands with a high Ge concentration. We will show that LEPECVD can be effectively used for the controlled growth of ordered arrays of SiGe islands. In order to control the nucleation of the islands, patterned Si (001) substrates were obtained by e-beam lithography (EBL) and dry etching. We realized periodic circular pits with diameters ranging from 80 to 300 nm and depths from 65 to 75 nm. Subsequently, thin films (0.8-3.2 nm) of pure Ge were deposited by LEPECVD, resulting in regular and uniform arrays of Ge-rich islands. LEPECVD allowed the use of a wide range of growth rates (0.01-0.1 nm s-1) and substrates temperatures (600-750°C), so that the Ge content of the islands could be varied. Island morphology was characterized by AFM, while μ-Raman was used to analyze the Ge content inside the islands and the composition differences between islands on patterned and unpatterned areas of the substrate. © 2010 The Author(s).
Articolo in rivista - Articolo scientifico
μ-Raman; e-Beam lithography; Low-energy plasma-enhanced chemical vapor deposition growth; Pre-patterned Si substrate; SiGe islands;
English
2010
5
12
1917
1920
none
Bollani, M., Bonera, E., Chrastina, D., Fedorov, A., Montuori, V., Picco, A., et al. (2010). Ordered Arrays of SiGe Islands from Low-Energy PECVD. NANOSCALE RESEARCH LETTERS, 5(12), 1917-1920 [10.1007/s11671-010-9773-0].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/23481
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