Advanced ACTPol (AdvACT) is a third-generation cosmic microwave background receiver to be deployed in 2016 on the Atacama Cosmology Telescope (ACT). Spanning five frequency bands from 25 to 280 GHz and having just over 5600 transition-edge sensor (TES) bolometers, this receiver will exhibit increased sensitivity and mapping speed compared to previously fielded ACT instruments. This paper presents the fabrication processes developed by NIST to scale to large arrays of feedhorn-coupled multichroic AlMn-based TES polarimeters on 150-mm diameter wafers. In addition to describing the streamlined fabrication process which enables high yields of densely packed detectors across larger wafers, we report the details of process improvements for sensor (AlMn) and insulator (SiNx) materials and microwave structures, and the resulting performance improvements.

Duff, S., Austermann, J., Beall, J., Becker, D., Datta, R., Gallardo, P., et al. (2016). Advanced ACTPol Multichroic Polarimeter Array Fabrication Process for 150 mm Wafers. JOURNAL OF LOW TEMPERATURE PHYSICS, 184(3-4), 634-641 [10.1007/s10909-016-1576-y].

Advanced ACTPol Multichroic Polarimeter Array Fabrication Process for 150 mm Wafers

Nati F.;
2016

Abstract

Advanced ACTPol (AdvACT) is a third-generation cosmic microwave background receiver to be deployed in 2016 on the Atacama Cosmology Telescope (ACT). Spanning five frequency bands from 25 to 280 GHz and having just over 5600 transition-edge sensor (TES) bolometers, this receiver will exhibit increased sensitivity and mapping speed compared to previously fielded ACT instruments. This paper presents the fabrication processes developed by NIST to scale to large arrays of feedhorn-coupled multichroic AlMn-based TES polarimeters on 150-mm diameter wafers. In addition to describing the streamlined fabrication process which enables high yields of densely packed detectors across larger wafers, we report the details of process improvements for sensor (AlMn) and insulator (SiNx) materials and microwave structures, and the resulting performance improvements.
Articolo in rivista - Articolo scientifico
AlMn; Multichroic; Polarimeter; SiN; x; Transition-edge sensor;
English
2016
184
3-4
634
641
none
Duff, S., Austermann, J., Beall, J., Becker, D., Datta, R., Gallardo, P., et al. (2016). Advanced ACTPol Multichroic Polarimeter Array Fabrication Process for 150 mm Wafers. JOURNAL OF LOW TEMPERATURE PHYSICS, 184(3-4), 634-641 [10.1007/s10909-016-1576-y].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/217329
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