Titanium dioxide (TiO 2 ) is a wide gap semiconductor suitable for many applications. In this work, TiO 2 nanostructured thin films are deposited by a plasma assisted supersonic deposition technique on silicon and on conductive glass substrates. Optical Emission Spectroscopy (OES) is used to monitor plasma conditions and precursor dissociation reactions. The influence of deposition parameters on TiO 2 structure, uniformity, grain size, and optical properties are investigated by atomic force microscopy (AFM), mechanical profilometer, scanning electron microscopy (SEM) and spectroscopic ellipsometry (SE). Experimental results show how employed technique allows obtaining uniform films, with a tunable deposition range. Grains size could be chosen varying precursor flux during the deposition process. Films nanostructure and porosity result to be affected by grains size. Substrate roughness results to affect film morphology.

Dell'Orto, E., Caldirola, S., Sassella, A., Morandi, V., Riccardi, C. (2017). Growth and properties of nanostructured titanium dioxide deposited by supersonic plasma jet deposition. APPLIED SURFACE SCIENCE, 425, 407-415 [10.1016/j.apsusc.2017.07.059].

Growth and properties of nanostructured titanium dioxide deposited by supersonic plasma jet deposition

Dell'Orto, EC
;
Caldirola, S;Sassella, A;Riccardi, C
2017

Abstract

Titanium dioxide (TiO 2 ) is a wide gap semiconductor suitable for many applications. In this work, TiO 2 nanostructured thin films are deposited by a plasma assisted supersonic deposition technique on silicon and on conductive glass substrates. Optical Emission Spectroscopy (OES) is used to monitor plasma conditions and precursor dissociation reactions. The influence of deposition parameters on TiO 2 structure, uniformity, grain size, and optical properties are investigated by atomic force microscopy (AFM), mechanical profilometer, scanning electron microscopy (SEM) and spectroscopic ellipsometry (SE). Experimental results show how employed technique allows obtaining uniform films, with a tunable deposition range. Grains size could be chosen varying precursor flux during the deposition process. Films nanostructure and porosity result to be affected by grains size. Substrate roughness results to affect film morphology.
Articolo in rivista - Articolo scientifico
Plasma enhanced deposition; Thin film; Titanium dioxide;
Plasma enhanced deposition; Thin film; Titanium dioxide; Surfaces, Coatings and Films
English
407
415
9
Dell'Orto, E., Caldirola, S., Sassella, A., Morandi, V., Riccardi, C. (2017). Growth and properties of nanostructured titanium dioxide deposited by supersonic plasma jet deposition. APPLIED SURFACE SCIENCE, 425, 407-415 [10.1016/j.apsusc.2017.07.059].
Dell'Orto, E; Caldirola, S; Sassella, A; Morandi, V; Riccardi, C
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/183165
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