Computer codes which simulate the photolithographic process are open-loop problem solvers: given the inputs and parameters, a result is predicted. Control theory, as suggested herewith, may help in closing the feedback loop and allow process design and optimisation. As an example, polychromatic exposure is dealt with, which aims at reducing the standing wave effect. Resist activator dynamics and the scalar field equation are included. A minimisation problem is defined, to which complex Lagrangian theory is applied. Optimal inputs can be searched for by an algorithm of which the flow chart is given.

Crosta, G. (1983). A Model for Polychromatic Photoresist Exposure in Optical Microlithography. In R.J. Jacobsson, Bennett JM, C.G. Granqvist, & J.H. [...] Apfel (a cura di), Proceedings Of The Society Of Photo-Optical Instrumentation Engineers - vol. 401 - Thin film technologies (pp. 180-189). Bellingham : Soc Photo-Optical Instrumentation Engineers [10.1117/12.935517].

A Model for Polychromatic Photoresist Exposure in Optical Microlithography

CROSTA, GIOVANNI FRANCO FILIPPO
Primo
1983

Abstract

Computer codes which simulate the photolithographic process are open-loop problem solvers: given the inputs and parameters, a result is predicted. Control theory, as suggested herewith, may help in closing the feedback loop and allow process design and optimisation. As an example, polychromatic exposure is dealt with, which aims at reducing the standing wave effect. Resist activator dynamics and the scalar field equation are included. A minimisation problem is defined, to which complex Lagrangian theory is applied. Optimal inputs can be searched for by an algorithm of which the flow chart is given.
No
Scientifica
Capitolo o saggio
microfabrication; microlithography; photoresist dynamics; Helmholtz equation; standing wave effect; optimal control; polychromatic exposure; reaction-propagation system; intensity functional; complex Lagrangian theory; calculus of variations
English
Proceedings Of The Society Of Photo-Optical Instrumentation Engineers - vol. 401 - Thin film technologies
0-89252-436-7
Research supported by Ministry of Public Education grant: MPI 60%, 1982-1983. Article based on a talk delivered by Giovanni Franco Crosta at 1983 SPIE International Conference/Europe in Genf, CH at Seminar 401 ``Thin film technologies'', session 3 on Thursday 1983 April 21, 10:00. The presentation slides are enclosed.
Crosta, G. (1983). A Model for Polychromatic Photoresist Exposure in Optical Microlithography. In R.J. Jacobsson, Bennett JM, C.G. Granqvist, & J.H. [...] Apfel (a cura di), Proceedings Of The Society Of Photo-Optical Instrumentation Engineers - vol. 401 - Thin film technologies (pp. 180-189). Bellingham : Soc Photo-Optical Instrumentation Engineers [10.1117/12.935517].
Crosta, G
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/10281/96522
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