Titanium dioxide (TiO2) materials are widely used in a variety of applications in the environmental and energy fields, such as self-cleaning surfaces, sensors, hydrogen generation by water photo-electrolysis, and photo-electrochemical conversion (e.g. DSSC and thin film solar cells) Paulose et al. (Nanotechnology 17:398, 2006) and Burschka et al. (Nature 499:316–319, 2013). In this work we use Plasma Assisted Supersonic Jet Deposition (PA-SJD) to realize TiO2 thin film deposition Biganzoli et al. (J Mod Phys 3:1626, 2012). Vaporizable and stable monomer could be employed as the source of the oxides, the semiconductors or even the metals. In this work Titanium isopropoxide (Ti{OCH(CH3)2}4), commonly referred as TTIP, is used as organometallic precursor. We have studied TiO2 thin film roughness and morphology, and we have compared it to results obtained from numerical simulation of deposition process. So it is possible to relate surface morphology to film structure properties.

Dell'Orto, E., Caldirola, S., Roman, H., Riccardi, C. (2015). Nanostructured TiO2 Film Deposition by Supersonic Plasma Jet Source for Energetic Application. Intervento presentato a: 2nd International Congress on Energy Efficiency and Energy Related Materials (ENEFM2014), Oludeniz, Fethiye/Mugla, Turkey [10.1007/978-3-319-16901-9_43].

Nanostructured TiO2 Film Deposition by Supersonic Plasma Jet Source for Energetic Application

DELL'ORTO, ELISA CAMILLA
Primo
;
CALDIROLA, STEFANO
Secondo
;
ROMAN, HECTOR EDUARDO
Penultimo
;
RICCARDI, CLAUDIA
Ultimo
2015

Abstract

Titanium dioxide (TiO2) materials are widely used in a variety of applications in the environmental and energy fields, such as self-cleaning surfaces, sensors, hydrogen generation by water photo-electrolysis, and photo-electrochemical conversion (e.g. DSSC and thin film solar cells) Paulose et al. (Nanotechnology 17:398, 2006) and Burschka et al. (Nature 499:316–319, 2013). In this work we use Plasma Assisted Supersonic Jet Deposition (PA-SJD) to realize TiO2 thin film deposition Biganzoli et al. (J Mod Phys 3:1626, 2012). Vaporizable and stable monomer could be employed as the source of the oxides, the semiconductors or even the metals. In this work Titanium isopropoxide (Ti{OCH(CH3)2}4), commonly referred as TTIP, is used as organometallic precursor. We have studied TiO2 thin film roughness and morphology, and we have compared it to results obtained from numerical simulation of deposition process. So it is possible to relate surface morphology to film structure properties.
No
poster + paper
Titanium dioxide, nanostructured films, plasma enhanced deposition.
English
2nd International Congress on Energy Efficiency and Energy Related Materials (ENEFM2014)
978-3-319-16900-2
Dell'Orto, E., Caldirola, S., Roman, H., Riccardi, C. (2015). Nanostructured TiO2 Film Deposition by Supersonic Plasma Jet Source for Energetic Application. Intervento presentato a: 2nd International Congress on Energy Efficiency and Energy Related Materials (ENEFM2014), Oludeniz, Fethiye/Mugla, Turkey [10.1007/978-3-319-16901-9_43].
Dell'Orto, E; Caldirola, S; Roman, H; Riccardi, C
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/88451
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