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Barni, R., Zanini, S., Siliprandi, R., Esena, P., Riccardi, C. (2007). Trends in plasma applications. In Proceedings of the 3rd International Conference on the Frontiers of Plasma Physics and Technology (pp.S2-3.1-S2-3.10). Vienna : IAEA.

Trends in plasma applications

BARNI, RUGGERO;ZANINI, STEFANO;RICCARDI, CLAUDIA
2007
paper
Plasma processing
English
3rd International Conference on the Frontiers of Plasma Physics and Technology
2007
Proceedings of the 3rd International Conference on the Frontiers of Plasma Physics and Technology
978-92-0-159608-6
2007
S2-3.1
S2-3.10
none
Barni, R., Zanini, S., Siliprandi, R., Esena, P., Riccardi, C. (2007). Trends in plasma applications. In Proceedings of the 3rd International Conference on the Frontiers of Plasma Physics and Technology (pp.S2-3.1-S2-3.10). Vienna : IAEA.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/8789
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