Characterization of a Supersonic Plasma Jet by Means of Optical Emission Spectroscopy

We discuss an innovative thin film deposition method, Plasma Assisted Supersonic Jet Deposition, which combines the chemistry richness of a reactive cold plasma environment and the assembly control of the film growth allowed by a supersonic jet directed at the substrate. Optical Emission Spectroscopy was used to characterize the plasma state and the supersonic jet, together with its interaction with the substrate. We obtained several results in the deposition of silicon oxide thin films from Hexamethyldisiloxane, with different degrees of organic groups retention. In particular we exploited the features of emission spectra to measure the plasma dissociation and oxidation degree of the organic groups, as a function of the jet parameters. If controlled growth is achieved, such films are nanostructured materials suitable for applications like catalysis, photo catalysis, energy conversion and storage, besides their traditional uses as a barrier or protective coatings.