PL spectra and peak shift obtained by applying a gradually increasing voltage are shown in Fig. 1b. We report up to 7 nm mode shift when the applied bias reaches 8.6 V. By further increasing the voltage we observe the well-known pull-in phenomenon: the cantilever collapses on the substrate because electrostatic forces win over elastic forces. We attribute the need for high voltages to fabrication issues and imperfections such as the complete erosion of the p-doped InGaAsP layer in the photonic crystal region during the sacrificial layer etching. Further process optimization should result in PCCs with Q factors10'000, electromechanically tunable over 30 nm. © 2011 IEEE.
Midolo, L., Van Veldhoven, P., Notzel, R., Dundar, M., Fiore, A. (2011). Electromechanical tuning of double-membrane Photonic Crystal Cavities. In 2011 Conference on Lasers and Electro-Optics Europe and 12th European Quantum Electronics Conference, CLEO EUROPE/EQEC 2011 (pp.1-1) [10.1109/CLEOE.2011.5943210].
Electromechanical tuning of double-membrane Photonic Crystal Cavities
Notzel R.;
2011
Abstract
PL spectra and peak shift obtained by applying a gradually increasing voltage are shown in Fig. 1b. We report up to 7 nm mode shift when the applied bias reaches 8.6 V. By further increasing the voltage we observe the well-known pull-in phenomenon: the cantilever collapses on the substrate because electrostatic forces win over elastic forces. We attribute the need for high voltages to fabrication issues and imperfections such as the complete erosion of the p-doped InGaAsP layer in the photonic crystal region during the sacrificial layer etching. Further process optimization should result in PCCs with Q factors10'000, electromechanically tunable over 30 nm. © 2011 IEEE.
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