In this work we show the possibility to increase the optical quality of quantum dots grown by droplet epitaxy on Ge-on-Si substrates in terms of single dot emission linewidth, decay time and efficiency by operating on the As pressure during the crystallization step without increasing the thermal budget. © 2013 Elsevier B.V. All rights reserved.

Bietti, S., Cavigli, L., Minari, S., Adorno, S., Isella, G., Vinattieri, A., et al. (2013). Effects of As pressure on the quality of GaAs/AlGaAs quantum dots grown on silicon by droplet epitaxy. JOURNAL OF CRYSTAL GROWTH, 378, 497-500 [10.1016/j.jcrysgro.2012.12.078].

Effects of As pressure on the quality of GaAs/AlGaAs quantum dots grown on silicon by droplet epitaxy

BIETTI, SERGIO;ADORNO, SILVIA;SANGUINETTI, STEFANO
2013

Abstract

In this work we show the possibility to increase the optical quality of quantum dots grown by droplet epitaxy on Ge-on-Si substrates in terms of single dot emission linewidth, decay time and efficiency by operating on the As pressure during the crystallization step without increasing the thermal budget. © 2013 Elsevier B.V. All rights reserved.
Articolo in rivista - Articolo scientifico
GaAs, Molecular Beam Epitaxy, quantum nanostructures
English
2013
378
497
500
none
Bietti, S., Cavigli, L., Minari, S., Adorno, S., Isella, G., Vinattieri, A., et al. (2013). Effects of As pressure on the quality of GaAs/AlGaAs quantum dots grown on silicon by droplet epitaxy. JOURNAL OF CRYSTAL GROWTH, 378, 497-500 [10.1016/j.jcrysgro.2012.12.078].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/53272
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