In microelectronic device manufacturing, photosensitive organic insulators (POIs) are widely used during passivation steps to protect and preserve the chips from damage due to subsequent processes and from the external environment. To ensure high performance and to maintain chip quality, a well-controlled POI lithography process and corresponding defectivity monitoring are needed. In this work, we present an automated method developed by STMicroelectronics and KLA for POI defectivity and process control employing a KLA 8 Series inspection system with illumination in the visible range. The highly sensitive macro inspection tool with dedicated analysis approaches and solutions successfully enabled the detection of the principal defects of interest, the identification of defectivity root causes through automatic classification and review, and the evaluation of the layer thickness and uniformity through reflected intensity heatmaps. For several months, this protocol has been applied to the production environment, proving to be effective in detecting even small deviations from the standard process. Here, we present some promising results obtained with this strategy, highlighting the benefits in terms of rework reduction and improved equipment management.

Corno, A., Bordogna, A., Braga, M., Pescalli, A., Ferrario, F., Iessi, U., et al. (2020). Photosensitive organic insulator photo-cell monitoring through advanced macro inspection. In Proceedings of SPIE - The International Society for Optical Engineering. SPIE [10.1117/12.2551884].

Photosensitive organic insulator photo-cell monitoring through advanced macro inspection

Salamone M.;
2020

Abstract

In microelectronic device manufacturing, photosensitive organic insulators (POIs) are widely used during passivation steps to protect and preserve the chips from damage due to subsequent processes and from the external environment. To ensure high performance and to maintain chip quality, a well-controlled POI lithography process and corresponding defectivity monitoring are needed. In this work, we present an automated method developed by STMicroelectronics and KLA for POI defectivity and process control employing a KLA 8 Series inspection system with illumination in the visible range. The highly sensitive macro inspection tool with dedicated analysis approaches and solutions successfully enabled the detection of the principal defects of interest, the identification of defectivity root causes through automatic classification and review, and the evaluation of the layer thickness and uniformity through reflected intensity heatmaps. For several months, this protocol has been applied to the production environment, proving to be effective in detecting even small deviations from the standard process. Here, we present some promising results obtained with this strategy, highlighting the benefits in terms of rework reduction and improved equipment management.
paper
Photosensitive Organic Insulators (POIs); Macro inspection; Process Control; Yield improvement; Photo Cell Monitoring (PCM);
English
Metrology, Inspection, and Process Control for Microlithography XXXIV 2020 - 24 February 2020through 27 February 2020
2020
Adan, Ofer
Proceedings of SPIE - The International Society for Optical Engineering
9781510634176
2020
11325
113252K
reserved
Corno, A., Bordogna, A., Braga, M., Pescalli, A., Ferrario, F., Iessi, U., et al. (2020). Photosensitive organic insulator photo-cell monitoring through advanced macro inspection. In Proceedings of SPIE - The International Society for Optical Engineering. SPIE [10.1117/12.2551884].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/506959
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