This paper presents a new approach for patterning Josephson junctions using a UV lithography process with direct laser writing and image reversal resist. The fabricated junctions with A1/AlOx/A1 on Si substrates achieved a resolution close to 0.8 μ m and an aspect ratio near to 1: 1, which is crucial for optimal performance as a switch in quantum bits. Compared to conventional Electron Beam Lithography (EBL), this method offers cost-effectiveness and high reproducibility. The junctions' quality was characterized using normal state resistance measurements with a 4-terminal probe and current sweeps. Our results demonstrate the potential of this new technique for achieving high-quality Josephson junctions for use in advanced applications such as quantum computing and superconductivity research.
Verna, A., Fasolo, L., Zannoni, M., Giachero, A., Labranca, D., Origo, L., et al. (2023). A Promising Alternative to Conventional EBL: UV Lithography with Direct Laser Writing for Josephson Junction Patterning. In 2023 IEEE Nanotechnology Materials and Devices Conference, NMDC 2023 (pp.480-481). Institute of Electrical and Electronics Engineers Inc. [10.1109/NMDC57951.2023.10343589].
A Promising Alternative to Conventional EBL: UV Lithography with Direct Laser Writing for Josephson Junction Patterning
Zannoni M.;Giachero A.;Labranca D.;Origo L.;Faverzani M.;Moretti R.;
2023
Abstract
This paper presents a new approach for patterning Josephson junctions using a UV lithography process with direct laser writing and image reversal resist. The fabricated junctions with A1/AlOx/A1 on Si substrates achieved a resolution close to 0.8 μ m and an aspect ratio near to 1: 1, which is crucial for optimal performance as a switch in quantum bits. Compared to conventional Electron Beam Lithography (EBL), this method offers cost-effectiveness and high reproducibility. The junctions' quality was characterized using normal state resistance measurements with a 4-terminal probe and current sweeps. Our results demonstrate the potential of this new technique for achieving high-quality Josephson junctions for use in advanced applications such as quantum computing and superconductivity research.
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