Electromodulation of SiH and SiOH vibrational bands at a hydrogen-implanted SiSiO2 interface in a multiple-internal-reflectance configuration is reported. Dipole stregthening and Stark shifts are calculated and theoretical lineshapes derived from their combinations are compared with the experimental electromodulation curves. © 1983.

Stella, A., Miglio, L., Palik, E., Holm, R., & Hughes, H. (1983). Sih and sioh electromodulation at si-sio2 interfaces in a multiple internal reflectance configuration. PHYSICA. A, 117(MAR), 777-778 [10.1016/0378-4363(83)90649-6].

Sih and sioh electromodulation at si-sio2 interfaces in a multiple internal reflectance configuration

MIGLIO, LEONIDA;
1983

Abstract

Electromodulation of SiH and SiOH vibrational bands at a hydrogen-implanted SiSiO2 interface in a multiple-internal-reflectance configuration is reported. Dipole stregthening and Stark shifts are calculated and theoretical lineshapes derived from their combinations are compared with the experimental electromodulation curves. © 1983.
Articolo in rivista - Articolo scientifico
SIH, SIOH
English
777
778
2
Stella, A., Miglio, L., Palik, E., Holm, R., & Hughes, H. (1983). Sih and sioh electromodulation at si-sio2 interfaces in a multiple internal reflectance configuration. PHYSICA. A, 117(MAR), 777-778 [10.1016/0378-4363(83)90649-6].
Stella, A; Miglio, L; Palik, E; Holm, R; Hughes, H
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/44173
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