In this paper we analyse the extent of grain orientation before and after the C49-C54 transformation in TiSi2;?, depending on the substrate microstructure and the lateral dimensions of the film. In the former case, for blanket configuration, we make a comparison to the corresponding evolution in surface roughness, both by AFM and by light scattering measurements. In the second case, an interpretation of the strong texturing occurring in narrow lines, independently of substrate microstructure, is,given on the basis of surface energy calculations. (C) 1999 Elsevier Science Ltd. All rights reserved.
Miglio, L., Iannuzzi, M., Grimaldi, M., La Via, F., Marabelli, F., Bocelli, S., et al. (1999). Texturing, surface energetics and morphology in the C49-C54 transformation of TiSi2. In Symposium on Materials and Processes for Submicron Technologies, at the E-MRS Spring Meeting (pp.1069-1074). Elsevier Science Ltd [10.1016/S0038-1101(99)00026-X].
Texturing, surface energetics and morphology in the C49-C54 transformation of TiSi2
Miglio, L
;
1999
Abstract
In this paper we analyse the extent of grain orientation before and after the C49-C54 transformation in TiSi2;?, depending on the substrate microstructure and the lateral dimensions of the film. In the former case, for blanket configuration, we make a comparison to the corresponding evolution in surface roughness, both by AFM and by light scattering measurements. In the second case, an interpretation of the strong texturing occurring in narrow lines, independently of substrate microstructure, is,given on the basis of surface energy calculations. (C) 1999 Elsevier Science Ltd. All rights reserved.
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