Boron-carbon coatings are typically accomplished by ion-assisted methods that generate energetic species of tens to hundreds of electron volt to facilitate the nucleation and growth processes. These energetic particles simultaneously induce a significant intrinsic stress leading to the film delamination, limiting the achievable thickness of the films to approximately a few hundred nanometers and creating difficulties for their technical applications. In this paper we propose a plasma method using an RF (13.56. MHz) capacitive system as a deposition technique to realize B-C coatings with a low residual intrinsic stress. A stable coating has been obtained by deposition of a multilayered structure in conditions of very low deposition rate. SEM micrographs show that the layers making up the coating are dense, without pores or cracks, and with a good adhesion to the substrates. © 2012 Elsevier B.V.

Vassallo, E., Caniello, R., Cremona, A., Croci, G., Dellasega, D., Gorini, G., et al. (2013). Deposition of boron-carbon multilayer coatings by RF plasma sputtering. SURFACE & COATINGS TECHNOLOGY, 214, 59-62 [10.1016/j.surfcoat.2012.11.001].

Deposition of boron-carbon multilayer coatings by RF plasma sputtering

CROCI, GABRIELE;GORINI, GIUSEPPE;GROSSO, GIORGIA;
2013

Abstract

Boron-carbon coatings are typically accomplished by ion-assisted methods that generate energetic species of tens to hundreds of electron volt to facilitate the nucleation and growth processes. These energetic particles simultaneously induce a significant intrinsic stress leading to the film delamination, limiting the achievable thickness of the films to approximately a few hundred nanometers and creating difficulties for their technical applications. In this paper we propose a plasma method using an RF (13.56. MHz) capacitive system as a deposition technique to realize B-C coatings with a low residual intrinsic stress. A stable coating has been obtained by deposition of a multilayered structure in conditions of very low deposition rate. SEM micrographs show that the layers making up the coating are dense, without pores or cracks, and with a good adhesion to the substrates. © 2012 Elsevier B.V.
Articolo in rivista - Articolo scientifico
Scientifica
boron carbon multilayer; plasma sputtering
English
Vassallo, E., Caniello, R., Cremona, A., Croci, G., Dellasega, D., Gorini, G., et al. (2013). Deposition of boron-carbon multilayer coatings by RF plasma sputtering. SURFACE & COATINGS TECHNOLOGY, 214, 59-62 [10.1016/j.surfcoat.2012.11.001].
Vassallo, E; Caniello, R; Cremona, A; Croci, G; Dellasega, D; Gorini, G; Grosso, G; Miorin, E; Passoni, M; Tardocchi, M
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/10281/44112
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