We report the first synthesis of CoSi in the CsCl structure, as an epitaxial film on Si(111). Experimentally and theoretically we find that the lower stability of this phase, relative to that of FeSi with the same structure, can be understood only by taking into account the energy contribution for the interface bonding, in addition to the elastic energy. © 1995 The American Physical Society.

Vonkanel, H., Schwarz, C., Goncalvesconto, S., Muller, E., Miglio, L., Tavazza, F., et al. (1995). New epitaxially stabilized cosi phase with the cscl structure. PHYSICAL REVIEW LETTERS, 74(7), 1163-1166 [10.1103/PhysRevLett.74.1163].

New epitaxially stabilized cosi phase with the cscl structure

MIGLIO, LEONIDA;
1995

Abstract

We report the first synthesis of CoSi in the CsCl structure, as an epitaxial film on Si(111). Experimentally and theoretically we find that the lower stability of this phase, relative to that of FeSi with the same structure, can be understood only by taking into account the energy contribution for the interface bonding, in addition to the elastic energy. © 1995 The American Physical Society.
Articolo in rivista - Articolo scientifico
epitaxy
English
1995
74
7
1163
1166
none
Vonkanel, H., Schwarz, C., Goncalvesconto, S., Muller, E., Miglio, L., Tavazza, F., et al. (1995). New epitaxially stabilized cosi phase with the cscl structure. PHYSICAL REVIEW LETTERS, 74(7), 1163-1166 [10.1103/PhysRevLett.74.1163].
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/44069
Citazioni
  • Scopus 74
  • ???jsp.display-item.citation.isi??? 74
Social impact