Full-band atomistic quantum transport simulations based on first principles are employed to assess the potential of band-to-band tunneling FETs (TFETs) with a 2-D channel material as future electronic circuit components. We demonstrate that single-layer (SL) transition metal dichalcogenides are not well suited for TFET applications. There might, however, exist a great variety of 2-D semiconductors that have not even been exfoliated yet; this paper pinpoints some of the most promising candidates among them to realize highly efficient TFETs. SL SnTe, As, TiNBr, and Bi are all found to ideally deliver ON-currents larger than 100 μA/μm at 0.5-V supply voltage and 0.1 nA/μm OFF-current value. We show that going from single to multiple layers can boost the TFET performance as long as the gain from a narrowing bandgap exceeds the loss from the deteriorating gate control. Finally, a 2-D van der Waals heterojunction TFET is revealed to perform almost as well as the best SL homojunction, paving the way for research in optimal 2-D material combinations.

Szabo, A., Klinkert, C., Campi, D., Stieger, C., Marzari, N., Luisier, M. (2018). Ab Initio Simulation of Band-to-Band Tunneling FETs with Single- and Few-Layer 2-D Materials as Channels. IEEE TRANSACTIONS ON ELECTRON DEVICES, 65(10), 4180-4187 [10.1109/TED.2018.2840436].

Ab Initio Simulation of Band-to-Band Tunneling FETs with Single- and Few-Layer 2-D Materials as Channels

Campi D.;
2018

Abstract

Full-band atomistic quantum transport simulations based on first principles are employed to assess the potential of band-to-band tunneling FETs (TFETs) with a 2-D channel material as future electronic circuit components. We demonstrate that single-layer (SL) transition metal dichalcogenides are not well suited for TFET applications. There might, however, exist a great variety of 2-D semiconductors that have not even been exfoliated yet; this paper pinpoints some of the most promising candidates among them to realize highly efficient TFETs. SL SnTe, As, TiNBr, and Bi are all found to ideally deliver ON-currents larger than 100 μA/μm at 0.5-V supply voltage and 0.1 nA/μm OFF-current value. We show that going from single to multiple layers can boost the TFET performance as long as the gain from a narrowing bandgap exceeds the loss from the deteriorating gate control. Finally, a 2-D van der Waals heterojunction TFET is revealed to perform almost as well as the best SL homojunction, paving the way for research in optimal 2-D material combinations.
Articolo in rivista - Articolo scientifico
2-D materials; ab initio; device simulation; quantum transport; tunneling FET (TFET);
English
2018
65
10
4180
4187
8374834
none
Szabo, A., Klinkert, C., Campi, D., Stieger, C., Marzari, N., Luisier, M. (2018). Ab Initio Simulation of Band-to-Band Tunneling FETs with Single- and Few-Layer 2-D Materials as Channels. IEEE TRANSACTIONS ON ELECTRON DEVICES, 65(10), 4180-4187 [10.1109/TED.2018.2840436].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/409816
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