Electrostatic fluctuations (up to 500 kHz) have been studied in a planar dc magnetron device using Langmuir probes measuring the floating potential and the ion saturation current. Fluctuation levels as high as 30% have been found inside the magnetic trap. A two-point spectral analysis has shown that the fluctuations are due to coherent modes with a low azimuthal mode number. The modes are present only when the discharge power and the neutral gas pressure are above a threshold. Their frequency spacing decreases when the neutral gas pressure is raised, so that increasing the pressure leads to a more turbulent state. The modes have been interpreted as unstable EXB/density gradient modes. © 2001 American Institute of Physics.

Martines, E., Cavazzana, R., Serianni, G., Spolaore, M., Tramontin, L., Zuin, M., et al. (2001). Electrostatic fluctuations in a direct current magnetron sputtering plasma. PHYSICS OF PLASMAS, 8(6), 3042-3050 [10.1063/1.1369657].

Electrostatic fluctuations in a direct current magnetron sputtering plasma

Martines E
Primo
;
2001

Abstract

Electrostatic fluctuations (up to 500 kHz) have been studied in a planar dc magnetron device using Langmuir probes measuring the floating potential and the ion saturation current. Fluctuation levels as high as 30% have been found inside the magnetic trap. A two-point spectral analysis has shown that the fluctuations are due to coherent modes with a low azimuthal mode number. The modes are present only when the discharge power and the neutral gas pressure are above a threshold. Their frequency spacing decreases when the neutral gas pressure is raised, so that increasing the pressure leads to a more turbulent state. The modes have been interpreted as unstable EXB/density gradient modes. © 2001 American Institute of Physics.
Articolo in rivista - Articolo scientifico
magnetron sputtering; electrostatic fluctuations;
English
3042
3050
9
Martines, E., Cavazzana, R., Serianni, G., Spolaore, M., Tramontin, L., Zuin, M., et al. (2001). Electrostatic fluctuations in a direct current magnetron sputtering plasma. PHYSICS OF PLASMAS, 8(6), 3042-3050 [10.1063/1.1369657].
Martines, E; Cavazzana, R; Serianni, G; Spolaore, M; Tramontin, L; Zuin, M; Antoni, V
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/365839
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