The electron temperature, ion density, plasma potential and magnetic field are measured in a plasma produced by a magnetron sputtering device. The magnetic field has been mapped by measuring the axial and radial components with Hall probes. The plasma parameters have been measured by a diagnostic system consisting of several Langmuir probes with different collecting areas that can be positioned by a linear translator. The automatic analysis system allows one to take into account non-saturation of the ion current due to sheath thickness variation. The Langmuir probes have been used in various conditions of magnetic field and source power with a gas filling pressure of 1Pa. It has been found that the diagnostic system gives reliable measurements of the plasma parameters in static and inhomogeneous magnetic fields.

Spolaore, M., Antoni, V., Bagatin, M., Buffa, A., Cavazzana, R., Desideri, D., et al. (1999). Automatic Langmuir probe measurement in a magnetron sputtering system. SURFACE & COATINGS TECHNOLOGY, 116-119(September 1999), 1083-1088 [10.1016/S0257-8972(99)00122-X].

Automatic Langmuir probe measurement in a magnetron sputtering system

Martines E;
1999

Abstract

The electron temperature, ion density, plasma potential and magnetic field are measured in a plasma produced by a magnetron sputtering device. The magnetic field has been mapped by measuring the axial and radial components with Hall probes. The plasma parameters have been measured by a diagnostic system consisting of several Langmuir probes with different collecting areas that can be positioned by a linear translator. The automatic analysis system allows one to take into account non-saturation of the ion current due to sheath thickness variation. The Langmuir probes have been used in various conditions of magnetic field and source power with a gas filling pressure of 1Pa. It has been found that the diagnostic system gives reliable measurements of the plasma parameters in static and inhomogeneous magnetic fields.
Articolo in rivista - Articolo scientifico
Electron temperature; Ion density; Langmuir probe; Magnetron sputtering;
English
1083
1088
6
Spolaore, M., Antoni, V., Bagatin, M., Buffa, A., Cavazzana, R., Desideri, D., et al. (1999). Automatic Langmuir probe measurement in a magnetron sputtering system. SURFACE & COATINGS TECHNOLOGY, 116-119(September 1999), 1083-1088 [10.1016/S0257-8972(99)00122-X].
Spolaore, M; Antoni, V; Bagatin, M; Buffa, A; Cavazzana, R; Desideri, D; Martines, E; Pomaro, N; Serianni, G; Tramontin, L
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/365672
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