Boron diffusivity in single-crystal diamond has been investigated. To this aim, a novel method using impedance spectroscopy for the study of the atomic diffusivity in wide-gap semiconductor has been developed, along with a model for the analysis of the dielectric response function. The advantages of this procedure are discussed. Boron diffusivity in diamond has been determined to be 6.9×10-20 cm2 s-1 at 800°C. A discussion of the results and a comparison with previous estimates are presented.

Narducci, D., Cuomo, J. (1990). Boron diffusivity in nonimplanted diamond single crystals measured by impedance spectroscopy. JOURNAL OF APPLIED PHYSICS, 68(3), 1184-1186 [10.1063/1.346714].

Boron diffusivity in nonimplanted diamond single crystals measured by impedance spectroscopy

Narducci D.;
1990

Abstract

Boron diffusivity in single-crystal diamond has been investigated. To this aim, a novel method using impedance spectroscopy for the study of the atomic diffusivity in wide-gap semiconductor has been developed, along with a model for the analysis of the dielectric response function. The advantages of this procedure are discussed. Boron diffusivity in diamond has been determined to be 6.9×10-20 cm2 s-1 at 800°C. A discussion of the results and a comparison with previous estimates are presented.
Articolo in rivista - Articolo scientifico
Diamond; Impedance Spectroscopy; Diffusion;
English
4-giu-1998
1990
68
3
1184
1186
reserved
Narducci, D., Cuomo, J. (1990). Boron diffusivity in nonimplanted diamond single crystals measured by impedance spectroscopy. JOURNAL OF APPLIED PHYSICS, 68(3), 1184-1186 [10.1063/1.346714].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/346405
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