We present here the fabrication, via droplet epitaxy, of GaAs/AlGaAs quantum dots with high optical efficiency on Si. The growth substrate lattice parameter was adapted to that of (Al)GaAs via Ge virtual substrates (GeVS). The samples clearly show the presence of quantum dot self-assembly, with the designed shape and density. Photoluminescence measurements, performed at low temperature, show an intense emission band from the quantum dots

Bietti, S., Sanguinetti, S., Somaschini, C., Koguchi, N., Isella, G., Chrastina, D., et al. (2009). Fabrication of GaAs quantum dots by droplet epitaxy on Si/Ge virtual substrate. IOP CONFERENCE SERIES: MATERIALS SCIENCE AND ENGINEERING, 6, 012009-1-012009-4 [10.1088/1757-899X/6/1/012009].

Fabrication of GaAs quantum dots by droplet epitaxy on Si/Ge virtual substrate

BIETTI, SERGIO;SANGUINETTI, STEFANO;SOMASCHINI, CLAUDIO;
2009

Abstract

We present here the fabrication, via droplet epitaxy, of GaAs/AlGaAs quantum dots with high optical efficiency on Si. The growth substrate lattice parameter was adapted to that of (Al)GaAs via Ge virtual substrates (GeVS). The samples clearly show the presence of quantum dot self-assembly, with the designed shape and density. Photoluminescence measurements, performed at low temperature, show an intense emission band from the quantum dots
Articolo in rivista - Articolo scientifico
quantum nanostructures, molecular beam epitaxy, III-V semiconductors
English
2009
6
012009-1
012009-4
none
Bietti, S., Sanguinetti, S., Somaschini, C., Koguchi, N., Isella, G., Chrastina, D., et al. (2009). Fabrication of GaAs quantum dots by droplet epitaxy on Si/Ge virtual substrate. IOP CONFERENCE SERIES: MATERIALS SCIENCE AND ENGINEERING, 6, 012009-1-012009-4 [10.1088/1757-899X/6/1/012009].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/33781
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