By means of first-principles calculations we studied the decomposition pathways of SiH3 on Ge(100) and of GeH3 on Si(100), of interest for the growth of crystalline SiGe alloys and Si/Ge heterostructures by plasma-enhanced chemical vapor deposition. We also investigated H desorption via reaction of two adsorbed SiH2/GeH2 species (beta(2) reaction) or via Eley-Rideal abstraction of surface H atoms from the impinging SiH3 and GeH3 species. The calculated activation energies for the different processes suggest that the rate-limiting step for the growth of Si/Ge systems is still the beta(2) reaction of two SiH2 as in the growth of crystalline Si.
Ceriotti, M., Montalenti, F., Bernasconi, M. (2012). Density functional study of the decomposition pathways of SiH3 and GeH3 at the Si(100) and Ge(100) surfaces. JOURNAL OF PHYSICS. CONDENSED MATTER, 24(10) [10.1088/0953-8984/24/10/104002].
Density functional study of the decomposition pathways of SiH3 and GeH3 at the Si(100) and Ge(100) surfaces
MONTALENTI, FRANCESCO CIMBRO MATTIA;BERNASCONI, MARCO
2012
Abstract
By means of first-principles calculations we studied the decomposition pathways of SiH3 on Ge(100) and of GeH3 on Si(100), of interest for the growth of crystalline SiGe alloys and Si/Ge heterostructures by plasma-enhanced chemical vapor deposition. We also investigated H desorption via reaction of two adsorbed SiH2/GeH2 species (beta(2) reaction) or via Eley-Rideal abstraction of surface H atoms from the impinging SiH3 and GeH3 species. The calculated activation energies for the different processes suggest that the rate-limiting step for the growth of Si/Ge systems is still the beta(2) reaction of two SiH2 as in the growth of crystalline Si.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.