A double plasma device (DPD) is tested for different operational configurations to identify suitable control for plasma parameters in a weakly ionized, unmagnetized plasma discharge. A separation grid is installed between the two chambers of DPD, which allows filtering of plasma from the first to the second chamber. Investigations are carried out to control the plasma parameters, especially the electron temperature by exploring the role of the grid. The grid bias is varied between-25-0 V and 0-30 V to reflect cooling and heating of plasma. The electron heating and cooling is prominent for the maximum ratio of n source/n target. The electron energy distribution function (EEDF) is obtained to describe the role of grid biasing in controlling the electron temperature in the second chamber. We demonstrated control on the radial profile of electron temperature by charging different radial cross-sections of plasma differently by using a multi-grid assembly system (MGAS). We have also identified the suitable operational regime for DPD where exercising a radial control on electron temperature is possible. Such plasmas can facilitate investigations on electron temperature control for applications in plasma processing, cold-plasma material interaction, etc where low energy electrons are desired.
Alex, P., Sanyasi, A., Srivastav, P., Awasthi, L., Srivastava, P., Sugandhi, R. (2020). Radial control of electron temperature gradient with optimized operational configuration of double plasma device. PLASMA SOURCES SCIENCE & TECHNOLOGY, 29(8) [10.1088/1361-6595/ab9233].
Radial control of electron temperature gradient with optimized operational configuration of double plasma device
Alex, PrincePrimo
;
2020
Abstract
A double plasma device (DPD) is tested for different operational configurations to identify suitable control for plasma parameters in a weakly ionized, unmagnetized plasma discharge. A separation grid is installed between the two chambers of DPD, which allows filtering of plasma from the first to the second chamber. Investigations are carried out to control the plasma parameters, especially the electron temperature by exploring the role of the grid. The grid bias is varied between-25-0 V and 0-30 V to reflect cooling and heating of plasma. The electron heating and cooling is prominent for the maximum ratio of n source/n target. The electron energy distribution function (EEDF) is obtained to describe the role of grid biasing in controlling the electron temperature in the second chamber. We demonstrated control on the radial profile of electron temperature by charging different radial cross-sections of plasma differently by using a multi-grid assembly system (MGAS). We have also identified the suitable operational regime for DPD where exercising a radial control on electron temperature is possible. Such plasmas can facilitate investigations on electron temperature control for applications in plasma processing, cold-plasma material interaction, etc where low energy electrons are desired.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.