We present the detailed fabrication method of two different GaAs nanostructures with cylindrical symmetry by the Droplet Epitaxy technique. Concentric Multiple Rings or Coupled Rings/Disks are successfully obtained, exploiting the lateral growth around the Ga droplets, through a fine control of the crystallization dynamics. © 2010 IOP Publishing Ltd.

Somaschini, C., Bietti, S., Sanguinetti, S., Koguchi, N., Fedorov, A. (2010). Control of the lateral growth morphology in GaAs droplet epitaxy. JOURNAL OF PHYSICS. CONFERENCE SERIES, 245(1), 012082 [10.1088/1742-6596/245/1/012082].

Control of the lateral growth morphology in GaAs droplet epitaxy

SOMASCHINI, CLAUDIO;BIETTI, SERGIO;SANGUINETTI, STEFANO
;
2010

Abstract

We present the detailed fabrication method of two different GaAs nanostructures with cylindrical symmetry by the Droplet Epitaxy technique. Concentric Multiple Rings or Coupled Rings/Disks are successfully obtained, exploiting the lateral growth around the Ga droplets, through a fine control of the crystallization dynamics. © 2010 IOP Publishing Ltd.
Articolo in rivista - Articolo scientifico
quantum nanostructures; dropet epitaxy, III-V semiconductor
English
2010
245
1
012082
012082
none
Somaschini, C., Bietti, S., Sanguinetti, S., Koguchi, N., Fedorov, A. (2010). Control of the lateral growth morphology in GaAs droplet epitaxy. JOURNAL OF PHYSICS. CONFERENCE SERIES, 245(1), 012082 [10.1088/1742-6596/245/1/012082].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/23686
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