A chemically stable bilayers of SiO2 (2D silica) is a new, wide band gap 2D material. Up till now graphene has been the only 2D material where the bending rigidity has been measured. Here we present inelastic helium atom scattering data from 2D silica on Ru(0001) and extract the first bending rigidity, κ, measurements for a nonmonoatomic 2D material of definable thickness. We find a value of κ=8.8 eV±0.5 eV which is of the same order of magnitude as theoretical values in the literature for freestanding crystalline 2D silica.

Büchner, C., Eder, S., Nesse, T., Kuhness, D., Schlexer, P., Pacchioni, G., et al. (2018). Bending Rigidity of 2D Silica. PHYSICAL REVIEW LETTERS, 120(22), 226101 [10.1103/PhysRevLett.120.226101].

Bending Rigidity of 2D Silica

SCHLEXER, PHILOMENA DENIZ;Pacchioni, G;
2018

Abstract

A chemically stable bilayers of SiO2 (2D silica) is a new, wide band gap 2D material. Up till now graphene has been the only 2D material where the bending rigidity has been measured. Here we present inelastic helium atom scattering data from 2D silica on Ru(0001) and extract the first bending rigidity, κ, measurements for a nonmonoatomic 2D material of definable thickness. We find a value of κ=8.8 eV±0.5 eV which is of the same order of magnitude as theoretical values in the literature for freestanding crystalline 2D silica.
Articolo in rivista - Articolo scientifico
Physics and Astronomy (all)
English
2018
120
22
226101
226101
none
Büchner, C., Eder, S., Nesse, T., Kuhness, D., Schlexer, P., Pacchioni, G., et al. (2018). Bending Rigidity of 2D Silica. PHYSICAL REVIEW LETTERS, 120(22), 226101 [10.1103/PhysRevLett.120.226101].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/212291
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