This paper presents the results of an irradiation study on single transistors manufactured in a 28 nm high-k commercial CMOS technology up to 1 Grad. Both nMOSFET and pMOSFET transistors have been irradiated and electrical parameters have been measured. For nMOSFETs, the leakage current shows an increase of 2-3 orders of magnitude, while only moderate degradation for other parameters has been observed. For pMOSFETs, a more severe degradation of parameters has been measured, especially in the drain current. This work is relevant as the evaluation of a new generation of CMOS technologies to be used in future HEP experiments.
Mattiazzo, S., Bagatin, M., Bisello, D., Gerardin, S., Marchioro, A., Paccagnella, A., et al. (2017). Total Ionizing Dose effects on a 28 nm Hi-K metal-gate CMOS technology up to 1 Grad. JOURNAL OF INSTRUMENTATION, 12(2) [10.1088/1748-0221/12/02/C02003].
Total Ionizing Dose effects on a 28 nm Hi-K metal-gate CMOS technology up to 1 Grad
Pezzotta, A;Baschirotto, A
2017
Abstract
This paper presents the results of an irradiation study on single transistors manufactured in a 28 nm high-k commercial CMOS technology up to 1 Grad. Both nMOSFET and pMOSFET transistors have been irradiated and electrical parameters have been measured. For nMOSFETs, the leakage current shows an increase of 2-3 orders of magnitude, while only moderate degradation for other parameters has been observed. For pMOSFETs, a more severe degradation of parameters has been measured, especially in the drain current. This work is relevant as the evaluation of a new generation of CMOS technologies to be used in future HEP experiments.
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