The electrical properties of cluster-assembled nanostructured palladium oxide (ns-PdOx) thin films grown by supersonic cluster beam deposition have been characterized by means of a customized ac current-sensing atomic force microscope. Scanning impedance microscopy is shown to provide a deep picture of the electrical properties of thin nanostructured interfaces even in the case of very soft and poorly adherent films. In particular, the dielectric constant of ns-PdOx can be quantitatively determined as well as its I-V characteristics. Moreover, the measurement of the tip-sample parasitic capacitance can be exploited to probe the overall mesoscale conductive character of thin films and to give a complementary and more precise view of the oxidation of ns-PdOx obtained by x-ray photoemission spectroscopy. © 2009 The American Physical Society.
Cassina, V., Gerosa, L., Podestà, A., Ferrari, G., Sampietro, M., Fiorentini, F., et al. (2009). Nanoscale electrical properties of cluster-assembled palladium oxide thin films. PHYSICAL REVIEW. B, CONDENSED MATTER AND MATERIALS PHYSICS, 79(11) [10.1103/PhysRevB.79.115422].
Nanoscale electrical properties of cluster-assembled palladium oxide thin films
CASSINA, VALERIA;
2009
Abstract
The electrical properties of cluster-assembled nanostructured palladium oxide (ns-PdOx) thin films grown by supersonic cluster beam deposition have been characterized by means of a customized ac current-sensing atomic force microscope. Scanning impedance microscopy is shown to provide a deep picture of the electrical properties of thin nanostructured interfaces even in the case of very soft and poorly adherent films. In particular, the dielectric constant of ns-PdOx can be quantitatively determined as well as its I-V characteristics. Moreover, the measurement of the tip-sample parasitic capacitance can be exploited to probe the overall mesoscale conductive character of thin films and to give a complementary and more precise view of the oxidation of ns-PdOx obtained by x-ray photoemission spectroscopy. © 2009 The American Physical Society.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.