An atmospheric pressure plasma process for material surface modification is studied. We employ a dielectric barrier discharge (DBD) device in which one of the electrodes is a rotating cylinder. The discharge setup is enclosed in a vacuum chamber connected to a gas mixing system and a liquid precursor evaporator. Such experimental setup allows to reproduce continuous processing in arbitrary atmosphere composition and pressure. We study the deposition process of thin organosilicon films generated at atmospheric pressure in nitrogen with small admixtures of hexametyldisiloxane (HMDSO) vapours. The characteristics of the plasma discharge have been studied by means of current-voltage measurements and optical emission spectroscopy. Thin film composition has been characterized by means of FTIR spectroscopy. The morphology and surface properties have been studied on polyethylene substrates by means of contact angle measurements and atomic force microscopy.

Siliprandi, R., Barni, R., Zanini, S., Riccardi, C. (2007). Atmospheric pressure plasma deposition of organosilicon thin films. In Proceedings of the 3rd International Congress on Cold Atmospheric Pressure Plasmas: Sources and Applications (pp.151-154).

Atmospheric pressure plasma deposition of organosilicon thin films

BARNI, RUGGERO;ZANINI, STEFANO;RICCARDI, CLAUDIA
2007

Abstract

An atmospheric pressure plasma process for material surface modification is studied. We employ a dielectric barrier discharge (DBD) device in which one of the electrodes is a rotating cylinder. The discharge setup is enclosed in a vacuum chamber connected to a gas mixing system and a liquid precursor evaporator. Such experimental setup allows to reproduce continuous processing in arbitrary atmosphere composition and pressure. We study the deposition process of thin organosilicon films generated at atmospheric pressure in nitrogen with small admixtures of hexametyldisiloxane (HMDSO) vapours. The characteristics of the plasma discharge have been studied by means of current-voltage measurements and optical emission spectroscopy. Thin film composition has been characterized by means of FTIR spectroscopy. The morphology and surface properties have been studied on polyethylene substrates by means of contact angle measurements and atomic force microscopy.
slide + paper
plasma; dielectric barrier discharge; HMDSO;
English
3rd International Congress on Cold Atmospheric Pressure Plasmas: Sources and Applications,
2007
Proceedings of the 3rd International Congress on Cold Atmospheric Pressure Plasmas: Sources and Applications
2007
151
154
none
Siliprandi, R., Barni, R., Zanini, S., Riccardi, C. (2007). Atmospheric pressure plasma deposition of organosilicon thin films. In Proceedings of the 3rd International Congress on Cold Atmospheric Pressure Plasmas: Sources and Applications (pp.151-154).
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/1462
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