A novel, controllable nanostructured thin film deposition technique was proposed. It exploits the separation of the process in two distinct phases. First precursor dissociation and radical formation is performed in a dense oxidizing plasma. Then nucleation and aggregation of molecular clusters occur during the expansion into vacuum of a supersonic jet. This allows a superior control of cluster size and energy in the process of film growth.
Riccardi, C., Fumagalli, F., Bottani, C., Di Fonzo, F. (2009)Metodo e apparato per la deposizione di strati sottili nanostrutturati con morfologia e nanostruttura controllata ( Nanostrutture). Method and apparatus for depositing nanostructured thin layers with controlled morphology and nanostructure. . Brevetto No. MI2009A002107, PCT/EP2010/068539.
Metodo e apparato per la deposizione di strati sottili nanostrutturati con morfologia e nanostruttura controllata ( Nanostrutture). Method and apparatus for depositing nanostructured thin layers with controlled morphology and nanostructure
RICCARDI, CLAUDIA;FUMAGALLI, FRANCESCO;
2009
Abstract
A novel, controllable nanostructured thin film deposition technique was proposed. It exploits the separation of the process in two distinct phases. First precursor dissociation and radical formation is performed in a dense oxidizing plasma. Then nucleation and aggregation of molecular clusters occur during the expansion into vacuum of a supersonic jet. This allows a superior control of cluster size and energy in the process of film growth.
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