Plasma technology is a quickly developing field in industrial application for the optical, physical and chemical modification of material surfaces. In particular a major interest is focused on experiments but also on modeling of the atmospheric pressure discharges aimed to the optimization of surface treatment such as etching, activation, grafting or film deposition. To this purpose a quantitative understanding of the reactive species composition in the plasma phase can be achieved by studying the fundamental processes occurring during the generation of the discharge in a gas. We have performed simulations of the gas-phase composition through the implementation of a suitable numerical model of the chemical kinetics considering actually existing devices. We have analyzed an air atmospheric pressure plasma in a typical dielectric barrier discharge device. Such a discharge is usually made of several streamers or microdischarges so, as a first approximation, we have chosen to simulate the chemical kinetics induced in a single isolated streamer. We obtained neutral as well charged species densities as a function of time showing the behavior of species connected with streamer formation and propagation (a few ns) and with the gap voltage oscillation (10-100 ¿s). Also the very slow time scale (up to several ms) was investigated putting in evidence the effect of ion-recombination and diffusion. Then we have investigated the time evolution of chemical species density as a function of discharges parameters such as electron temperature and electron density. We also addressed questions regarding the effects on the kinetic behaviour of factors like the length of the discharge current pulse and the spatial dimension of the streamers.

Barni, R., Esena, P., Riccardi, C. (2005). Chemical kinetics simulations of an atmospheric pressure plasma device in air. SURFACE & COATINGS TECHNOLOGY, 200(1-4), 924-927 [10.1016/j.surfcoat.2005.01.069].

Chemical kinetics simulations of an atmospheric pressure plasma device in air

BARNI, RUGGERO;RICCARDI, CLAUDIA
2005

Abstract

Plasma technology is a quickly developing field in industrial application for the optical, physical and chemical modification of material surfaces. In particular a major interest is focused on experiments but also on modeling of the atmospheric pressure discharges aimed to the optimization of surface treatment such as etching, activation, grafting or film deposition. To this purpose a quantitative understanding of the reactive species composition in the plasma phase can be achieved by studying the fundamental processes occurring during the generation of the discharge in a gas. We have performed simulations of the gas-phase composition through the implementation of a suitable numerical model of the chemical kinetics considering actually existing devices. We have analyzed an air atmospheric pressure plasma in a typical dielectric barrier discharge device. Such a discharge is usually made of several streamers or microdischarges so, as a first approximation, we have chosen to simulate the chemical kinetics induced in a single isolated streamer. We obtained neutral as well charged species densities as a function of time showing the behavior of species connected with streamer formation and propagation (a few ns) and with the gap voltage oscillation (10-100 ¿s). Also the very slow time scale (up to several ms) was investigated putting in evidence the effect of ion-recombination and diffusion. Then we have investigated the time evolution of chemical species density as a function of discharges parameters such as electron temperature and electron density. We also addressed questions regarding the effects on the kinetic behaviour of factors like the length of the discharge current pulse and the spatial dimension of the streamers.
Articolo in rivista - Articolo scientifico
plasma simulation air chemical kinetics
English
2005
200
1-4
924
927
none
Barni, R., Esena, P., Riccardi, C. (2005). Chemical kinetics simulations of an atmospheric pressure plasma device in air. SURFACE & COATINGS TECHNOLOGY, 200(1-4), 924-927 [10.1016/j.surfcoat.2005.01.069].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/944
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