An inductively coupled plasma machine has been modified to be able to apply working powers in the order of 1 kW, thus switching to the real inductive H-mode. The plasma is generated by applying a 13.56 MHz radio-frequency to a λ/4 antenna outside the plasma chamber in low pressure conditions. The working gas is argon at pressure in the range from 10 to 100 Pa. With this high power source we have been able to perform plasma etching on a poly(vinyl-chloride) (PVC) film. In particular the effect of the plasma is the selective removal of hydrogen and chlorine from the sample surface. The action of the high power plasma on the sample has been proved to be much more effective than that of the low power one. Results similar to those obtained with the low power machine at about 300 W for 120 min, have been obtained with the high power source at about 600 W for 30 min. The superficial generation of a conductive layer of double C=C bonds was obtained. The samples have been investigated by means of ATR spectroscopy, FIB/SEM microscopy and micro-electrical measurements, which revealed the change in charge conductivity

Croccolo, F., Quintini, A., Barni, R., Ripamonti, M., Malgaroli, A., Riccardi, C. (2009). H-mode inductive coupling plasma for PVC surface treatment. THE EUROPEAN PHYSICAL JOURNAL. D, ATOMIC, MOLECULAR AND OPTICAL PHYSICS, 54(2), 477-480 [10.1140/epjd/e2009-00160-3].

H-mode inductive coupling plasma for PVC surface treatment

BARNI, RUGGERO;RICCARDI, CLAUDIA
2009

Abstract

An inductively coupled plasma machine has been modified to be able to apply working powers in the order of 1 kW, thus switching to the real inductive H-mode. The plasma is generated by applying a 13.56 MHz radio-frequency to a λ/4 antenna outside the plasma chamber in low pressure conditions. The working gas is argon at pressure in the range from 10 to 100 Pa. With this high power source we have been able to perform plasma etching on a poly(vinyl-chloride) (PVC) film. In particular the effect of the plasma is the selective removal of hydrogen and chlorine from the sample surface. The action of the high power plasma on the sample has been proved to be much more effective than that of the low power one. Results similar to those obtained with the low power machine at about 300 W for 120 min, have been obtained with the high power source at about 600 W for 30 min. The superficial generation of a conductive layer of double C=C bonds was obtained. The samples have been investigated by means of ATR spectroscopy, FIB/SEM microscopy and micro-electrical measurements, which revealed the change in charge conductivity
Articolo in rivista - Articolo scientifico
81.40.-z Treatment of materials and its effects on microstructure and properties, 82.35.Cd Conducting polymers, 52.40.Fd Plasma interactions with antennas, plasma-filled waveguides, 52.77.-j Plasma applications
English
2009
54
2
477
480
none
Croccolo, F., Quintini, A., Barni, R., Ripamonti, M., Malgaroli, A., Riccardi, C. (2009). H-mode inductive coupling plasma for PVC surface treatment. THE EUROPEAN PHYSICAL JOURNAL. D, ATOMIC, MOLECULAR AND OPTICAL PHYSICS, 54(2), 477-480 [10.1140/epjd/e2009-00160-3].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/7527
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