Deposition of silicon dioxide (SiO2) is a critical step of integrated circuit manufacturing; hence it is monitored during the manufacturing process at a grid of points defined on the wafer area. Since collecting thickness measurements is expensive, it is a compelling issue to investigate how a sub grid can be identified. A strategy based on spatial prediction and simulating annealing is proposed to tackle the problem which proved to be effective when applied to a real process. A diagnostic device for monitoring the deposition process is also discussed which can be usefully adopted in the day-to-day activity by practitioners acting in process control of a microelectronics fab. © 2012 Elsevier B.V. All rights reserved.

Borgoni, R., Radaelli, L., Tritto, V., Zappa, D. (2013). Optimal reduction of a spatial monitoring grid: Proposals and applications in process control. COMPUTATIONAL STATISTICS & DATA ANALYSIS, 58, 407-419 [10.1016/j.csda.2012.08.007].

Optimal reduction of a spatial monitoring grid: Proposals and applications in process control

BORGONI, RICCARDO;
2013

Abstract

Deposition of silicon dioxide (SiO2) is a critical step of integrated circuit manufacturing; hence it is monitored during the manufacturing process at a grid of points defined on the wafer area. Since collecting thickness measurements is expensive, it is a compelling issue to investigate how a sub grid can be identified. A strategy based on spatial prediction and simulating annealing is proposed to tackle the problem which proved to be effective when applied to a real process. A diagnostic device for monitoring the deposition process is also discussed which can be usefully adopted in the day-to-day activity by practitioners acting in process control of a microelectronics fab. © 2012 Elsevier B.V. All rights reserved.
Articolo in rivista - Articolo scientifico
Kriging, Simulated annealing, Spatial sampling, Statistics for microelectronics
English
2013
58
407
419
none
Borgoni, R., Radaelli, L., Tritto, V., Zappa, D. (2013). Optimal reduction of a spatial monitoring grid: Proposals and applications in process control. COMPUTATIONAL STATISTICS & DATA ANALYSIS, 58, 407-419 [10.1016/j.csda.2012.08.007].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/36430
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