We report resistivity measurements in the temperature range 0.15-1.2 K Performed on non-compensated Si:As samples doped by ion implantation on the insulating side of the metal-insulator transition. The data show a crossover of the variable-range-hopping (VRH) resistivity dependence rho(T) from rho is-proportional-to exp(T1/4/T)1/4 (Mott VRH predicted behaviour) to rho is-proportional-to exp(T1/2/T)1/2, which demonstrates the persistence of a Coulomb pp in the density of states even in the vicinity of the critical concentration. The simultaneous observation of the T1/4 and T1/2 parameters allows the determination of the effective size of the pp.
Pignatel, G., Sanguinetti, S. (1993). Coulomb Gap Measurement In Noncompensated Sias. JOURNAL OF PHYSICS. CONDENSED MATTER, 5(2), 191-198 [10.1088/0953-8984/5/2/007].
Coulomb Gap Measurement In Noncompensated Sias
SANGUINETTI, STEFANO
1993
Abstract
We report resistivity measurements in the temperature range 0.15-1.2 K Performed on non-compensated Si:As samples doped by ion implantation on the insulating side of the metal-insulator transition. The data show a crossover of the variable-range-hopping (VRH) resistivity dependence rho(T) from rho is-proportional-to exp(T1/4/T)1/4 (Mott VRH predicted behaviour) to rho is-proportional-to exp(T1/2/T)1/2, which demonstrates the persistence of a Coulomb pp in the density of states even in the vicinity of the critical concentration. The simultaneous observation of the T1/4 and T1/2 parameters allows the determination of the effective size of the pp.
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