The main feature of amorphous materials is the presence of excess vibrational modes at low energies, giving rise to the so-called “boson peak” in neutron and optical spectroscopies. These same modes manifest themselves as two-level systems (TLSs) causing noise and decoherence in qubits and other sensitive devices. Here, we present an experiment that uses the spin relaxation of dangling bonds at the Si/(amorphous)SiO2 interface as a probe of TLSs. We introduce a model that is able to explain the observed nonexponential electron spin inversion recovery and provides a measure of the degree of spatial localization and concentration of the TLSs close to the interface, their maximum energy, and its temperature dependence.

Belli, M., Fanciulli, M., de Sousa, R. (2020). Probing two-level systems with electron spin inversion recovery of defects at the Si/SiO2 interface. PHYSICAL REVIEW RESEARCH, 2(3) [10.1103/PhysRevResearch.2.033507].

Probing two-level systems with electron spin inversion recovery of defects at the Si/SiO2 interface

Fanciulli, M.
Co-primo
;
2020

Abstract

The main feature of amorphous materials is the presence of excess vibrational modes at low energies, giving rise to the so-called “boson peak” in neutron and optical spectroscopies. These same modes manifest themselves as two-level systems (TLSs) causing noise and decoherence in qubits and other sensitive devices. Here, we present an experiment that uses the spin relaxation of dangling bonds at the Si/(amorphous)SiO2 interface as a probe of TLSs. We introduce a model that is able to explain the observed nonexponential electron spin inversion recovery and provides a measure of the degree of spatial localization and concentration of the TLSs close to the interface, their maximum energy, and its temperature dependence.
Articolo in rivista - Articolo scientifico
Two-level systems; Spin resonance, silicon, siliconoxide, interface, nanowires
English
28-set-2020
2020
2
3
033507
open
Belli, M., Fanciulli, M., de Sousa, R. (2020). Probing two-level systems with electron spin inversion recovery of defects at the Si/SiO2 interface. PHYSICAL REVIEW RESEARCH, 2(3) [10.1103/PhysRevResearch.2.033507].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10281/294239
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