Good quality and perfectly stoichiometric GeO2 layers are promising interlayers to be implemented in alternative devices based on high dielectric constant oxide/Ge(100). In this work, the authors report on the growth by atomic layer deposition of GeO2 films using a divalent Ge precursor combined with O-3. The films are composed of smooth and perfectly stoichiometric GeO2. The contamination level is extremely low. The deposited GeO2 films have a band gap of 5.81 +/- 0.04 eV. The conduction and valence band offsets at the GeO2/Ge heterojunction are found to be 0.6 +/- 0.1 and 4.5 +/- 0.1 eV, respectively.
Perego, M., Scarel, G., Fanciulli, M., Fedushkin, I., Skatova, A. (2007). Fabrication of GeO2 layers using a divalent Ge precursor. APPLIED PHYSICS LETTERS, 90(16), 162115 [10.1063/1.2723684].
Fabrication of GeO2 layers using a divalent Ge precursor
FANCIULLI, MARCO;
2007
Abstract
Good quality and perfectly stoichiometric GeO2 layers are promising interlayers to be implemented in alternative devices based on high dielectric constant oxide/Ge(100). In this work, the authors report on the growth by atomic layer deposition of GeO2 films using a divalent Ge precursor combined with O-3. The films are composed of smooth and perfectly stoichiometric GeO2. The contamination level is extremely low. The deposited GeO2 films have a band gap of 5.81 +/- 0.04 eV. The conduction and valence band offsets at the GeO2/Ge heterojunction are found to be 0.6 +/- 0.1 and 4.5 +/- 0.1 eV, respectively.
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